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Solid State Technology

Volume: 49
Issue: 10
Date: October 01, 2006
Using oxygen and hydroxyl radicals for batch-furnace oxidation
Balancing the lifetime and residence time of radicals is critical to achieving acceptable radical oxidation growth rates and uniformities in large-batch reactors.
Meeting future SDE requirements using co-implantation and RTA
The requirements for the source/drain extensions of future devices are increasingly more demanding with respect to dopant activation, junction depth, and abruptness as semiconductor technology continu ...
A process window-based approach to mask optimization
Different performance and wafer-yield criteria apply to different types of integrated circuits, and the masks for those circuits may need to be optimized to achieve maximum value of production.
Controlling CD and process window limits for implant patterning
As design rules have shrunk, the overlay of implant layers has become a problem [1].
MEMS moves to the mainstream
The MEMS market has long been in a state of extreme fragmentation. Even now, according to a new report from France-based market research and consulting firm Yole Développement, MEMS devices are ...
World News
Worldwide silicon area wafer shipments rose another 4% in 2Q06 vs. the prior quarter to nearly 2000 million sq. inches (MSI), more proof that wafer suppliers are enjoying robust sales and heavy demand ...
SEMATECH optimizes the gate stack with dual high-k and metal gate
At the Symposium on VLSI Technology in June, SEMATECH reported on a new approach it has developed to meet ITRS requirements for low-standby power (LSTP) transistors for the 45nm technology generation.
Giving life to self-healing chips: preventing hard silicon failures
In a bid to enhance the performance of microprocessors, the Semiconductor Research Corp. (SRC) recently said it has a plan to develop self-healing chips-i.e., chips that don’t fail, having been ...
"Jumpy" chromophores could enable molecular electronics
Researchers at the U. of Pennsylvania and St. Josephs U. are touting their work on chromophores, which when linked together enable transfer of electrical charges that exceed mobility in organic semico ...
Vacuum systems for ALD
Atomic layer deposition (ALD) processes require vacuum conditions both for proper deposition and adequate purging of precursors from the chamber.
Product News
The IX-250 excimer laser micromachining system is a Class 1 industrial-grade workstation that can accommodate a variety of excimer lasers, offering 12 axes of motion, with 250mm×200mm travel (fo ...
Manufacturing challenges for immersion below 45nm
With the introduction of the immersion technique into deep-submicron patterning, the semiconductor industry will manage to keep up with the scaling roadmap using refraction-based lithography for anoth ...

Past Issues

2006

Volume Issue Date
49 12 Dec 01, 2006
49 11 Nov 01, 2006
49 10 Oct 01, 2006
49 9 Sep 01, 2006
49 8 Aug 01, 2006
49 7 Jul 01, 2006
49 6 Jun 01, 2006
49 5 May 01, 2006
49 4 Apr 01, 2006
49 3 Mar 01, 2006
49 2 Feb 01, 2006
49 1 Jan 01, 2006

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