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Solid State Technology

Volume: 48
Issue: 12
Date: December 01, 2005
Advanced prototyping using step-and-flash imprint
Developments in step-and-flash imprint lithography have enabled the support of advanced device and process prototyping with mix-and-match overlay capability compatible with photolithography tools.
An in-process strategy for defect-free CPL masks
The masks required for chromeless phase lithography can be successfully inspected for transparent defects and repaired by existing technology.
Using DFM hot-spot analysis for predicting resist patterns
As process tolerances decrease, significant yield losses are observed specifically due to differences between the design layout and how the resist actually prints on the wafer.
Preventive maintenance measures for contamination control
High concentrations of corrosive and toxic gases can be emitted from metal etch chambers and downstream pipelines during preventive maintenance.
Golden Years or Golden Age?
A familiar refrain from market analysts these days is that the semiconductor industry has “matured.”
World News
Technology News
Using AFM to enhance MOCVD-grown OE devices
Metal-organic chemical-vapor deposition (MOCVD) has steadily progressed from small-scale materials research to a mass production technology, enabling such complex optoelectronic (OE) devices as laser ...
Semiconductor suppliers turn to DFM at nanometer nodes
Design decisions made early in IC development can either complicate or alleviate a growing number of manufacturing challenges in advanced process technologies as feature sizes shrink well below 130nm.
Patterning neurons-on-chip devices using microcontact printing
Growing neurons on a chip surface holds great promise for brain research. Recently, a printing technique was developed that allows alignment and combination of different chemical patterns on a chip su ...
Top Products of 2005
Following are the Top Products of 2005 in semiconductor/thin-film processing as selected by Solid State Technology’s editorial advisory board, chosen from those featured each month in Pro ...
Local collaboration required for global nanotech competitiveness
Developers of nanotechnology are facing a conundrum. On one hand, new nanotechnology-based products have been produced and commercialized, yet on the other hand, the understanding of the underlying pr ...

Past Issues

2005

Volume Issue Date
48 12 Dec 01, 2005
48 11 Nov 01, 2005
48 10 Oct 01, 2005
48 9 Sep 01, 2005
48 8 Aug 01, 2005
48 7 Jul 01, 2005
48 6 Jun 01, 2005
48 5 May 01, 2005
48 4 Apr 01, 2005
48 3 Mar 01, 2005
48 2 Feb 01, 2005
48 1 Jan 01, 2005

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