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Microlithography World

Volume: 17
Issue: 2
Date: May 01, 2008
Thermal aberration control
Leading-edge exposure tools must provide a means to control and compensate for projection lens thermal aberrations that result from today’s high powered laser sources and advanced off-axis illum ...
Solving the gate ACLV and ADLV challenges with printing assist features
Double patterning can shrink tip-to-tip spacings and improve across-chip and across-device linewidth variation (ACLV and ADLV) versus single exposure processes.
Mask specifications: It’s not getting any easier
Moore’s Law, as practiced today by the semiconductor industry, is all about scaling.
Innovative refractive optics for exposure tool illumination
Arrays of refractive micro-optics are ideal homogenizing elements in illumination systems for exposure and metrology tools.
OPC for contacts
When you are using optical proximity correction (OPC) to optimize contacts and vias, the obvious solution is not always the correct solution.
Graphs and ethics in science
I don’t know if things have gotten worse, or if I have just become less tolerant.

Past Issues

2008

Volume Issue Date
17 4 Nov 01, 2008
17 3 Aug 01, 2008
17 2 May 01, 2008
17 1 Feb 01, 2008

Previous Years

2007 2006 2005 2004 2003 2002 2000
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