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Microlithography World

Volume: 17

Issue: 1

Date: February 01, 2008

Double patterning lithography: The bridge between low k1 ArF and EUV

Jo Finders, ASML, LA Veldhoven, The Netherlands, Mircea Dusa, ASML US Inc.

PEB plate optimization for CD uniformity

Kirsten Ruck, Heiko Weichert, Tokyo Electron Europe Ltd, Dresden, Germany Steffen Hornig, Frank Finger, Göran Fleischer, Qimonda Dresden GmbH & Co.

The Lithography Expert Focus averaging

Whether intentional or not, it is common for photoresist to be exposed by an image that is actually some average of images through focus.

A financial assessment of maskless lithography

Maskless lithography can be advantageous for low- and medium-volume 45nm manufacturing if multiple exposure tools with 5wph throughput can be delivered.

Peak oil, peak technology?

In 1956 geophysicist M. King Hubbert made a startling prediction: Oil production in the United States would peak and begin to decline in the 1970s.

NEWS

Past Issues

2008

Volume	Issue	Date
17	4	Nov 01, 2008
17	3	Aug 01, 2008
17	2	May 01, 2008
17	1	Feb 01, 2008

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2007 2006 2005 2004 2003 2002 2000

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