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Microlithography World

Volume: 15

Issue: 3

Date: August 01, 2006

How to run a world-class mask operation

The photomask industry has consolidated into a small number of vendors, all competing to be best at what they do as globalization and Moore’s Law make “what they do” more and more di ...

A defectivity checkpoint for immersion lithography

Immersion lithography is compared with dry lithography at the same numerical aperture (NA) and resolution in the context of actual manufacturing at the Crolles2 Alliance.

Characterizing scanner illuminators to match OPC

The illuminator profiles of different exposure tools produce different optical proximity effects (OPE) even when the nominal illumination parameters are the same.

Diffusion and resolution for chemically amplified resists

As discussed in the last edition of this column (MLW, May 2006), diffusion in conventional (nonchemically amplified) resists has a very predictable (and undesirable) impact on resolution.

There really is a litho wall

Optical lithography has transcended so many limits set by the promoters of next-generation lithographies that much of the industry acts as if it will live forever.