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Microlithography World

Volume: 15
Issue: 2
Date: May 01, 2006
Mask rule standards: A baby step for DfM
Standardized mask design rules (MDRs) and standardized definitions will allow various mask-related disciplines to communicate and converge efficiently on manufacturable (and inspectable) designs.
Litho-friendly design: A necessary complement to RET
Unobvious alterations in design improve the effectiveness of resolution enhancement technology without decreasing average circuit density.
The Lithography Expert: Diffusion and resolution
The diffusion of chemical species during post-exposure bake is a necessary evil.
Topcoat options for immersion resist
Three resist systems are commonly available for 193nm immersion lithography: resist with solvent-soluble topcoat or an aqueous developer-soluble topcoat, and special 193i immersion resist needing no t ...
A decade of changes
It has been ten years now since I took over the editorship of Microlithography World and began writing these editorials.
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Past Issues

2006

Volume Issue Date
15 4 Nov 01, 2006
15 3 Aug 01, 2006
15 2 May 01, 2006
15 1 Feb 01, 2006

Previous Years

2008 2007 2005 2004 2003 2002 2000
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