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Microlithography World

Volume: 15

Issue: 1

Date: February 01, 2006

Nanoimprint lithography: the semiconductor industry and beyond

Various versions of nanoimprint lithography have the potential to supercede optical patterning methods in many applications, if a few difficulties can be overcome.

A template infrastructure for step-and-flash imprint lithography

The templates needed for 1× step-and-flash imprint lithography can be fabricated using extensions of current optical mask manufacturing technology.

When DRC ends, DFM begins

A new methodology combines design rule check (DRC) and design for manufacturing (DFM) into one consistent deck of enforceable rules and introduces an implementation cutoff decided by technology and bu ...

The Lithography Expert: Horizontal-vertical bias: Part 2

In the last edition of this column, we looked at horizontal-vertical (H-V) bias, the systematic difference in linewidth between closely located horizontally and vertically oriented resist features tha ...

Design for manufacturing and policy for success

Last October, I went from the SPIE Symposium on Photomasks directly to cover a meeting of eminent engineers that advise the government in Washington, DC.

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