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Microlithography World

Volume: 14
Issue: 4
Date: November 01, 2005
Defectivity in water immersion lithography
The origin, nature, and impact of defects intrinsic to water immersion lithography are identified, along with mitigation strategies for controlling them.
Shape goes critical for sub-100nm process control
Feature shape control has become vital to yield. For features with high aspect ratios, 1D critical dimension (CD) measurements are inadequate.
The Lithography Expert: Horizontal-vertical bias
A nanometer here, a nanometer there. Before long, you’ve got a serious linewidth error.
Fast RET verification in a box?
Ever-decreasing lithography 1 values demand tighter design-to-manufacturing integration.
Needed: An admiral of the ‘Nano Sea’?
To accelerate the exploitation of structures with dimensions <100nm, the governments of the US, Japan, and the European Union have established Nanotechnology Initiatives.
NEWS & PRODUCTS

Past Issues

2005

Volume Issue Date
14 4 Nov 01, 2005
14 3 Aug 01, 2005
14 2 May 01, 2005
14 1 Feb 01, 2005

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