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Microlithography World

Volume: 14

Issue: 3

Date: August 01, 2005

Resist blur and line-edge roughness

Photoresist line-edge roughness (LER) is precisely what its name implies: The sidewalls or edges of resist features are rough, not smooth.

Impact of high-resolution photolithography on integrated photonics

Submicron-resolution laser maskwriters combined with reduction photolithography provide the means to produce powerful new kinds of integrated and free-space optical devices.

The Lithography Expert: The death of the aerial image

The aerial image is, quite literally, the image in air. In the world of semiconductor lithography, it is the image of a photomask projected onto the plane of the wafer, but assuming that only air occu ...

Litho enhancements for 45nm-node MuGFETs

Multigate FETs (MuGFET) (e.g., FinFETs or triple-gate MOSFETs) are becoming increasingly plausible for introduction at the 45nm node or afterward. However, the 3D nature of the device implies more com ...

Mourning Ma Bell

Let us now have ten picoseconds of silence to honor AT&T, the greatest corporation of the 20th century.

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