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Microlithography World

Volume: 14

Issue: 2

Date: May 01, 2005

First microprocessors printed with immersion lithography

Immersion lithography has emerged as the leading solution for semiconductor manufacturing for the 45nm node, in spite of a continuing concern about defects.

Knowledge-based automatic defect classification

A knowledge-based system for automatic defect classification can make subtle distinctions among macrodefect types, learn new types, and monitor their frequency while maintaining sufficient throughput ...

The Lithography Expert: Bottom antireflection coatings for high numerical aperture imaging

As we saw in the last edition of this column, bottom antireflective coatings (BARCs) are used extensively to reduce substrate reflectivity, helping to eliminate both standing waves and swing curves.

AAPSM space-imbalance reduction for 65nm lithography

Rigorous vector simulations show how to minimize the intensity imbalance of spaces with opposite phases for 65nm-node alternating-aperture phase-shifting masks.

Getting small at SPIE Microlithography

Every year, experts troop to Silicon Valley for the SPIE International Symposium on Microlithography.