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Solid State Technology - semiconductors, chips, integrated circuits

Technology

FSI puts the lid on a single-wafer cleaning system
Nov 03 -- FSI exec Scott Becker tells SST how the closed-chamber design of the company's new Orion single-wafer cleaning system addresses cleaning-related issues for 32nm and 22nm process technologies, such as material loss and galvanic corrosion....
 
Charge signature flags non-visual defects
Jul 31 -- Fabs have historically relied upon optical inspection as a robust, reliable, well-understood technique to find all kinds of defects, but shrinking feature sizes and more demanding surface cleanliness requirements are exposing its limits. Enter Qcept Technologies, which says its technique can identify defects by measuring changes in work function....
 
Novellus tips strip clean tools for logic, memory
May 20 -- by Ed Korczynski, Senior Technical Editor, Solid State Technology
May 20, 2008 - Kevin Jennings, VP and GM of Novellus' surface integrity division, tells WaferNEWS about the product evolution that has led to >400wph bulk stripping and >100wph for crusty implanted wafers -- as embodied in two new variations on the company's Gamma multi-station sequential processing architecture, targeting high-volume memory and logic/foundry fabs....
 
Edge: the final cleaning frontier
May 07 -- by Ed Korczynski, Senior Technical Editor, Solid State Technology
May 7, 2008 - Applied Materials product manager Paul Miller tells WaferNEWS about the inner workings of the company's new Inflexion edge polishing system that uses mechanical abrasion for removing defects on the wafer edge, touting 2× faster throughput than "competing" tools and an inherently "green" process....
 
AMAT's compact cleaning cluster for masks
Apr 23 -- by Ed Korczynski, Senior Technical Editor, Solid State Technology
April 23, 2008 - Cleaning has always been essential for mask manufacturing, but today there is increasing concern to the point where fabs may soon clean masks in-house to prevent haze buildup. Meanwhile, EUV and NIL don't use pellicles, which almost certainly will mean cleaning masks in production. Seeking to address this need/opportunity is Applied Material, with its new Tetra Reticle Clean tool....
 
 

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