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Technology / Lithography

Haze and sun for mask symposium
Oct 13 -- Highlights from last week's SPIE/BACUS Symposium on Photomask Technology in Monterey CA, include discussion of damage to pellicles caused by aggressive 193nm radiation, what's behind a new "sun effect" linked to clearing off reticle haze, more calls to replace chrome with opaque MoSi, why mask industry sales are improperly skewed, and the difficulty of migrating to smaller dimensions....
 
 

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