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Technology / Cleaning

AMAT's compact cleaning cluster for masks
Apr 23 -- by Ed Korczynski, Senior Technical Editor, Solid State Technology
April 23, 2008 - Cleaning has always been essential for mask manufacturing, but today there is increasing concern to the point where fabs may soon clean masks in-house to prevent haze buildup. Meanwhile, EUV and NIL don't use pellicles, which almost certainly will mean cleaning masks in production. Seeking to address this need/opportunity is Applied Material, with its new Tetra Reticle Clean tool....
 
 

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