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To 32nm and beyond: a design-manufacturing symbiosis
Nov 01 -- At the 32nm node, technology enablers such as double-patterning, strain enhancement, advanced OPC, etc., require design for manufacturing (DFM) to support a design through manufacturing (D2M) methodology that is correct-by-construction....
Commodity price pain, or sustainable opportunity?
Aug 01 -- Resource constraints are appearing with increasing frequency in our work and personal lives. Those constraints usually present themselves in the form of higher prices—as predicted by the classic supply-and-demand economic model....
Two keys that unlock 45nm OPC
May 01 -- Stepping into the sub-180nm world creates a new reality far different from what we have known and relied on in the past....
Riding the wave of CMP
Apr 01 -- CMP is rapidly becoming one of the most important and widespread fab processes enabling the continuation of device shrinks....
Scalable MEMS manufacturing
Mar 01 -- Traditionally, MEMS devices have been developed using a combination of custom design and manufacturing techniques in a select number of captive MEMS foundries or in one of the commercial specialty MEMS fabs that have sprung up in recent years....
Yield at any cost
Feb 01 -- Photomask costs are a painfully visible issue in today’s competitive semiconductor market....
Pure-play development foundries offer accelerated innovation
Nov 01 -- When process innovation is a requirement, a sound process development strategy is a must. Differentiation on silicon that is process- vs. design-based can hold very high returns for investors and technologists provided the innovation is accelerated via streamlined development efforts that understand both the development and the manufacturing challenges....
DFM: What’s real now?
Oct 01 -- After nearly half a decade, design for manufacturing (DFM) has not provided the expected value to erstwhile users, in spite of the perceived need and vaunted advantages....
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