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Departments / Contamination Control

Using existing production tools for low-cost thin wafer handling
Apr 01 -- In 2003, NXP CAEN opened a new pilot line dedicated to innovative solutions in system-in-a-package (SIP) on 150mm wafers....
 
In situ chemical cleaning for improved ion implanter utilization
Mar 01 -- The overall utilization efficiency of production ion implanters is strongly influenced by the build up of solid deposits inside the vacuum system....
 
Using ultrapure steam for water-contamination control
Mar 01 -- Multiple semiconductor and related processes-including diffusion, RTP, ALD, etch, and DUV lithography-currently use water vapor as part of manufacturing....
 
Enabling yield in automated material handling systems
Sep 01 -- The future of the semiconductor industry will depend on the ability of companies to introduce new solutions that improve fab productivity and maximize the return on investment in existing wafer fabs....
 
 

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